| 摘要 |
<p>A nanoimprint lithography device and a lithography method are used to perform lithography on a substrate, an inductive photoresist being coated on the surface of the substrate. The device comprises: a plate mold base; a conductive imprinting plate mold, provided on the surface of the plate mold base, the surface of the imprinting plate mold being disposed opposite the photoresist surface on the substrate, the imprinting plate mold having concave and convex patterns opposite to target patterns to be formed, and the concave and convex patterns being capable of contacting the inductive photoresist lithographed on the substrate; and an electron source, for providing electron flows for the concave and convex patterns on the imprinting plate mold. When the convex pattern on the imprinting plate mold contacts the inductive photoresist lithographed on the substrate, the electron flow on the convex pattern performs graphic light sensing on the inductive photoresist; therefore, the present invention has advantages of both nanoimprint technology and electron beam exposure technology, has high process compatibility, and can achieve higher yield and resolution.</p> |
