SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

摘要

In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W on which a cleaning liquid and a volatile solvent coexist. The magnetic field forming unit stirs and mixes the cleaning liquid and the volatile solvent on the surface of the substrate W to promote replacement of the cleaning liquid with the volatile solvent.

主权项

1. A substrate processing device comprising:
a cleaning liquid supply unit supplying a cleaning liquid to a surface of a substrate; a solvent supply unit supplying a volatile solvent to the surface of the substrate supplied with the cleaning liquid, and replacing the cleaning liquid on the surface of the substrate with the volatile solvent; and a heating and drying unit heating the surface of the substrate supplied with the volatile solvent to dry the surface of the substrate by removing droplets of the volatile solvent produced on the surface of the substrate by a heating operation, wherein the substrate processing device further comprises a magnetic field forming unit applying a magnetic field to the surface of the substrate on which the cleaning liquid and the volatile solvent coexist to promote the replacement of the cleaning liquid with the volatile solvent.