发明名称 METHOD FOR PRODUCING METAL OXIDE FILM, METAL OXIDE FILM, THIN-FILM TRANSISTOR, DISPLAY DEVICE, IMAGE SENSOR, AND X-RAY SENSOR
摘要 The present invention provides a method for producing a metal oxide film which includes: a step for coating a substrate with a solution containing a metal nitrate, and forming a metal oxide precursor film by drying the film coat; and a step for changing the metal oxide precursor film into a metal oxide film by irradiating the metal oxide precursor film with ultraviolet light containing two or more peak components for which the intensity of illumination is 10mW/cm2 or higher in a wavelength band at or below 300nm. The present invention further provides a metal oxide film produced by this method, and a device provided with the same.
申请公布号 WO2015045712(A1) 申请公布日期 2015.04.02
申请号 WO2014JP72340 申请日期 2014.08.26
申请人 FUJIFILM CORPORATION 发明人 TAKATA, MASAHIRO;TANAKA, ATSUSHI;SUZUKI, MASAYUKI
分类号 H01L21/368;C01B13/18;C01G15/00;G02F1/1368;H01L21/208;H01L21/336;H01L27/144;H01L27/146;H01L29/786;H01L51/50;H05B33/14 主分类号 H01L21/368
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