POSITION MEASURING APPARATUS, ALIGNMENT APPARATUS, PATTERN DRAWING APPARATUS, AND POSITION MEASURING METHOD

摘要

Provided is a position measuring technology capable of measuring the position of a substrate against light beam at high precision, an alignment apparatus using the position measuring technology, and a pattern drawing apparatus. A position measuring device comprises: a photographing part for photographing the light beam passing a first penetration part which is a part of a substrate having penetrability on the light beam and the first penetration part in the same view; and a position deducting part for calculating the position of the substrate based on the image photographed by the photographing part.