| 摘要 |
<p>The present invention as a deposition apparatus comprises: a process chamber; a drum provided in the process chamber and transferring a flexible object to be treated in a predetermined direction while rotating; an ion source provided in the process chamber to face the drum and laminating a predetermined laminated material on one surface of the flexible object to be treated; and a raw material supply unit supplying a precursor of the laminated material to the ion source. The ion source includes: a magnetic field unit of which one side facing the flexible object to be treated is opened and the other side is closed, wherein the open side has a plurality of magnetic poles arranged to be alternatively spaced apart and the closed side is connected to a magnetic core, thereby forming an accelerating closed loop of a plasma electron in the open side; a magnetic pole arranged in a lower portion of the accelerating closed loop of the magnetic field unit to be spaced apart from the magnetic field unit; and an insulating fixing unit which is filled between an inner surface of the magnetic field unit excluding a space of the accelerating closed loop and an outer surface of the magnetic pole and embeds and fixates the magnetic pole in the magnetic field unit, thereby generating a plasma ion for the laminated material from the precursor and supplying the ion to the flexible object to be treated.</p> |
