POLISHING METHOD AND POLISHING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a polishing method and a polishing device capable of reducing the consumption of a polishing liquid while maintaining a relatively high polishing rate.SOLUTION: In a polishing method where a polishing object is pressed to a polishing surface 52a with a top ring while supplying a polishing liquid from a polishing liquid supply port 108a to the polishing surface 52a of a polishing table 22 and the polishing object is polished while rotating the top ring holding the polishing object and the polishing surface 52a, the polishing liquid supply port 108a is moved when rotating the top ring in a high speed rotation region in which polishing rate distribution at the center of the polishing object is lower than that of an edge part.