发明名称 SEMICONDUCTOR CHIP AND STACKED SEMICONDUCTOR PACKAGE HAVING THE SAME
摘要 A semiconductor chip includes a substrate, through-electrodes passing through the substrate, and a dielectric layer formed between the substrate and the through-electrodes and having a dielectric constant decreasing structure.
申请公布号 US2015091139(A1) 申请公布日期 2015.04.02
申请号 US201414516672 申请日期 2014.10.17
申请人 SK hynix Inc. 发明人 SON Ho Young
分类号 H01L25/10;H01L23/48 主分类号 H01L25/10
代理机构 代理人
主权项 1. A stacked semiconductor package comprising: a plurality of semiconductor chips each including a substrate, through-electrodes passing through the substrate and a dielectric layer with a reduced dielectric constant formed between the substrate and the through-electrodes where the dielectric layer with a reduced dielectric constant has at least one air gap, and stacked such that through-electrodes of the plurality of semiconductor chips are connected with one another, wherein the dielectric layer with a reduced dielectric constant of the lowermost semiconductor chip has a highest dielectric constant among the semiconductor chips, dielectric constants of dielectric layers with a reduced dielectric constant gradually decrease toward an uppermost semiconductor chip, and the dielectric layer with a reduced dielectric constant of the uppermost semiconductor chip has a lowest dielectric constant, Wherein the semiconductor chips includes a first semiconductor chip, a second semiconductor chip which is stacked under the first semiconductor chip, and a third semiconductor chip which is stacked under the semiconductor chip, and Wherein the dielectric layer of the third semiconductor chip comprises a double-layered structure of a porous dielectric layer which has a plurality of air gaps therein and an air gap-free dielectric layer which has no air gap therein, the dielectric layer of the second semiconductor chip comprises a single-layered structure of a porous dielectric layer, and the dielectric layer of the first semiconductor chip comprises a single-layered structure of a hollow type dielectric layer which has an air gap defined in a center portion thereof.
地址 Icheon-si Gyeonggi-do KR