发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor that has a low off-state current, a high on-state current, and high field effect mobility.SOLUTION: In an inverted staggered thin-film transistor, a gate insulating layer is formed by laminating a nitride silicon layer and an oxide silicon layer obtained by oxidation of the nitride silicon layer, and a microcrystalline semiconductor layer which is crystal-grown from just above the boundary between the gate insulating layer and the oxide silicon layer is formed. It is possible to obtain a thin-film transistor having high crystallinity, a high on-state current, and high electron field-effect mobility because the crystal growth starts from just above the gate insulating film. In addition, a buffer layer is provided so as to reduce an off-state current.
申请公布号 JP2015062235(A) 申请公布日期 2015.04.02
申请号 JP20140218130 申请日期 2014.10.27
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 MORIKUBO MIYAKO;MIYAIRI HIDEKAZU;ISA TOSHIYUKI;TAKAHASHI ERIKA;ICHIJO MITSUHIRO;KURIKI KAZUKI;YOKOI TOMOKAZU
分类号 H01L21/336;G02F1/1345;G02F1/1368;H01L21/28;H01L29/786 主分类号 H01L21/336
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