Co-Cr-Pt-B BASE ALLOY SPUTTERING TARGET, AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a Co-Cr-Pt-B base alloy sputtering target with high leakage magnetic flux density and few micro cracks in a B-rich layer.SOLUTION: In a Co-Cr-Pt-B base alloy sputtering target, the number of cracks of 0.1-20μm is 10 or less in a B-rich phase in an area (field) of 100μm×100μm. In a Co-Cr-Pt-B base alloy sputtering target manufacturing method, a Co-Cr-Pt-B base alloy cast ingot is hot-forged or hot-rolled, and then cold-rolled or cold-forged at an elongation ratio of 4% or less. Furthermore, the ingot is machine-processed into a target.