METHOD OF DEPOSITING AN INORGANIC MATERIAL ON A SUBSTRATE, IN PARTICULAR A MICRON- OR SUBMICRON-SCALE TEXTURED SUBSTRATE

摘要

The present invention concerns a method of depositing an inorganic material (3) on a micron- or submicron-scale textured substrate (1) comprising the steps of preparing a solution made from inorganic precursors and a polymeric compound, depositing said solution on the substrate, and heat treating the substrate coated with the solution at a high temperature in order to break down the polymeric compound, characterised in that the polymeric compound is thermosetting, and the method comprises, before the heat treatment step, a step of so-called controlled setting of the polymeric compound. The method can be used to produce a coating layer with perfectly uniform surface distribution and thickness, in particular in the recesses and ridges of the substrate.