| 摘要 |
The invention relates to a method for producing a microsystem having pixels, comprising the following steps: providing a silicon wafer; producing thermal silicon oxide layers (5,6) on the surface of the silicon wafer; producing a platinum layer directly on the oxide (6); cooling the intermediate product; structuring the platinum layer in a pixel-like manner in order to form base electrodes (8, 12) of the pixels (7, 8); removing material on the side of the silicon wafer facing away from the oxide layer (5), such that a frame (3) remains and a membrane (4) formed by the oxide layers (5,6) is tensioned by the frame (3); finishing the microsystem (1). |
