METHOD FOR PRODUCING TRANSPARENT ELECTRICALLY-CONDUCTIVE FILM

摘要

Provided is a method for producing a transparent electrically-conductive film, whereby it becomes possible to form a transparent electrically-conductive layer having a reduced resistivity at a higher speed. The present invention is a method for producing a transparent electrically-conductive film, which comprises a step of forming a transparent electrically-conductive layer from targets each containing an indium-tin composite oxide on a base film by a sputtering method, wherein the sputtering method is a DC dual target sputtering method which is performed employing sputtering chambers in a sputtering film formation device, wherein two targets are provided per one sputtering chamber and a DC power supply is connected to each of the two targets.