发明名称 UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING
摘要 Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I):;;wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.
申请公布号 US2015093912(A1) 申请公布日期 2015.04.02
申请号 US201314039809 申请日期 2013.09.27
申请人 WU Hengpeng;YIN Jian;LIN Guanyang;KIM JiHoon;SHAN Jianhui 发明人 WU Hengpeng;YIN Jian;LIN Guanyang;KIM JiHoon;SHAN Jianhui
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项 1. A formulation for depositing an underlayer for promoting the formation of self assembled structures, comprising: a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; and b) a solvent.
地址 Hillsborough NJ US