发明名称 |
UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING |
摘要 |
Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I):;;wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer. |
申请公布号 |
US2015093912(A1) |
申请公布日期 |
2015.04.02 |
申请号 |
US201314039809 |
申请日期 |
2013.09.27 |
申请人 |
WU Hengpeng;YIN Jian;LIN Guanyang;KIM JiHoon;SHAN Jianhui |
发明人 |
WU Hengpeng;YIN Jian;LIN Guanyang;KIM JiHoon;SHAN Jianhui |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
1. A formulation for depositing an underlayer for promoting the formation of self assembled structures, comprising:
a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; and b) a solvent. |
地址 |
Hillsborough NJ US |