ENHANCED DEFECT DETECTION IN ELECTRON BEAM INSPECTION AND REVIEW

摘要

One embodiment relates to an electron beam apparatus for inspection and/or review. An electron source generates a primary electron beam, and an electron-optics system shapes and focuses said primary electron beam onto a sample held by a stage. A detection system detects signal-carrying electrons including secondary electrons and back-scattered electrons from said sample, and an image processing system processes data from said detection system. A host computer system that controls and coordinates operations of the electron-optics system, the detection system, and the image processing system. A graphical user interface shows a parameter space and provides for user selection and activation of operating parameters of the apparatus. Another embodiment relates to a method for detecting and/or reviewing defects using an electron beam apparatus. Other embodiments, aspects and features are also disclosed.

主权项

1. An electron beam apparatus for inspection and/or review, the apparatus comprising:
an electron source that generates a primary electron beam; a stage which carries a sample; an electron-optics system that shapes and focuses said primary electron beam onto said sample; a detection system that detects signal-carrying electrons including secondary electrons and back-scattered electrons from said sample; an image processing system that processes data from said detection system; a host computer system that controls and coordinates operations of the electron-optics system, the detection system, and the image processing system; and a graphical user interface which shows a parameter space and provides for user selection and activation of operating parameters of the apparatus.