| 摘要 |
<p>Provided is an apparatus for processing a substrate according to an embodiment of the present invention. An apparatus for processing a substrate includes: a fixing frame, a process module which can be installed to the fixing frame and provides an interior space, fan filter member which is fixed to the fixing frame and provides air to the space, and an air supply member which supplies air to the fan filter member. The air supply member includes a supply duct, a fan member which supplies air to the supply duct, and an intermediate duct which penetrates the fixing frame, and directly connects the process module and the fan filter member. Thereby, the air supply member is directly connected to the process module. The loss of the air can be minimized.</p> |
