发明名称 VERTICAL TRANSISTOR DEVICES FOR EMBEDDED MEMORY AND LOGIC TECHNOLOGIES
摘要 Vertical transistor devices are described. For example, in one embodiment, a vertical transistor device includes an epitaxial source semiconductor region disposed on a substrate, an epitaxial channel semiconductor region disposed on the source semiconductor region, an epitaxial drain semiconductor region disposed on the channel semiconductor region, and a gate electrode region surrounding sidewalls of the semiconductor channel region. A composition of at least one of the semiconductor regions varies along a longitudinal axis that is perpendicular with respect to a surface of the substrate.
申请公布号 US2015091058(A1) 申请公布日期 2015.04.02
申请号 US201314039696 申请日期 2013.09.27
申请人 Doyle Brian S.;Shah Uday;Kotlyar Roza;Kuo Charles C. 发明人 Doyle Brian S.;Shah Uday;Kotlyar Roza;Kuo Charles C.
分类号 H01L29/78;H01L29/10;H01L29/66 主分类号 H01L29/78
代理机构 代理人
主权项 1. A vertical transistor device, comprising: an epitaxial source semiconductor region disposed on a substrate; an epitaxial channel semiconductor region disposed on the source semiconductor region; an epitaxial drain semiconductor region disposed on the channel semiconductor region; and a gate electrode region surrounding a plurality of sidewalls of the semiconductor channel region, wherein a composition of at least one of the semiconductor regions varies along a longitudinal axis that is perpendicular with respect to a surface of the substrate.
地址 Portland OR US