发明名称 |
VERTICAL TRANSISTOR DEVICES FOR EMBEDDED MEMORY AND LOGIC TECHNOLOGIES |
摘要 |
Vertical transistor devices are described. For example, in one embodiment, a vertical transistor device includes an epitaxial source semiconductor region disposed on a substrate, an epitaxial channel semiconductor region disposed on the source semiconductor region, an epitaxial drain semiconductor region disposed on the channel semiconductor region, and a gate electrode region surrounding sidewalls of the semiconductor channel region. A composition of at least one of the semiconductor regions varies along a longitudinal axis that is perpendicular with respect to a surface of the substrate. |
申请公布号 |
US2015091058(A1) |
申请公布日期 |
2015.04.02 |
申请号 |
US201314039696 |
申请日期 |
2013.09.27 |
申请人 |
Doyle Brian S.;Shah Uday;Kotlyar Roza;Kuo Charles C. |
发明人 |
Doyle Brian S.;Shah Uday;Kotlyar Roza;Kuo Charles C. |
分类号 |
H01L29/78;H01L29/10;H01L29/66 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
1. A vertical transistor device, comprising:
an epitaxial source semiconductor region disposed on a substrate; an epitaxial channel semiconductor region disposed on the source semiconductor region; an epitaxial drain semiconductor region disposed on the channel semiconductor region; and a gate electrode region surrounding a plurality of sidewalls of the semiconductor channel region, wherein a composition of at least one of the semiconductor regions varies along a longitudinal axis that is perpendicular with respect to a surface of the substrate. |
地址 |
Portland OR US |