发明名称 EVAPORATION METHOD AND EVAPORATION DEVICE
摘要 Disclosed are an evaporation method and an evaporation device. The evaporation method comprises: successively arranging at least one mask above an underlay substrate; and forming at least one evaporation sub-pattern on the underlay substrate by means of the evaporation technology so as to form an evaporation pattern on the underlay substrate, the evaporation pattern being composed of the at least one evaporation sub-pattern. Since the finally formed evaporation pattern is composed of the at least one evaporation sub-pattern, when compared with the prior art, only a few opening regions need to be formed on each mask which is used for forming the evaporation sub-pattern, so that the width of a blocking region between the adjacent opening regions can be set to be larger, thereby avoiding the problem in the prior art that the PPI of a product is reduced because of using a mask which has a larger thickness and a larger number of opening regions on the mask, thus increasing the PPI of the product and improving the display resolution of the product.
申请公布号 WO2015043303(A1) 申请公布日期 2015.04.02
申请号 WO2014CN83005 申请日期 2014.07.25
申请人 BOE TECHNOLOGY GROUP CO., LTD.;ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. 发明人 CHEN, JUNSHENG;LI, CHENG
分类号 C23C14/04;C23C14/24;H01L51/52;H01L51/56 主分类号 C23C14/04
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