发明名称 FORMING LAYERS OF MATERIALS OVER SMALL REGIONS BY SELECTIVE CHEMICAL REACTION INCLUDING LIMITING ENCROACHMENT OF THE LAYERS OVER ADJACENT REGIONS
摘要 A method of an aspect includes forming a first thicker layer of a first material over a first region having a first surface material by separately forming each of a first plurality of thinner layers by selective chemical reaction. The method also includes limiting encroachment of each of the first plurality of thinner layers over a second region that is adjacent to the first region. A second thicker layer of a second material is formed over the second region having a second surface material that is different than the first surface material.
申请公布号 WO2015047345(A1) 申请公布日期 2015.04.02
申请号 WO2013US62456 申请日期 2013.09.27
申请人 INTEL CORPORATION;BRISTOL, ROBERT L.;BLACKWELL, JAMES M.;CLENDENNING, SCOTT B.;GSTREIN, FLORIAN;HAN, EUNGNAK;KLOSTER, GRANT M.;ROBERTS, JEANETTE M.;ROMERO, PATRICIO E.;HOURANI, RAMI 发明人 BRISTOL, ROBERT L.;BLACKWELL, JAMES M.;CLENDENNING, SCOTT B.;GSTREIN, FLORIAN;HAN, EUNGNAK;KLOSTER, GRANT M.;ROBERTS, JEANETTE M.;ROMERO, PATRICIO E.;HOURANI, RAMI
分类号 H01L21/31 主分类号 H01L21/31
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