METHOD FOR FORMING A PATTERNED FILM, METHOD FOR MANUFACTURING OPTICAL COMPONENT, METHOD FOR MANUFACTURING CIRCUIT BOARD, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT

摘要

A method is provided which allows the alignment marks of a mold and a substrate to be accurately and simply detected, and accordingly provides a method for forming a patterned film with a high throughput, and also provides a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A patterned film is formed by photo-nanoimprinting. In the method, a gas satisfies the following Inequality (1): In the Inequality (1), nR represents the refractive index of a composition not containing a gas at the wavelength of light, nR' represents the refractive index of the photo-curable composition containing the gas at the wavelength of the light, and nM represents the refractive index of a mold at the wavelength of the light.