发明名称 LOW-POWER GASEOUS PLASMA SOURCE
摘要 <p>A plasma source includes a first rod forming a quarterwave antenna, surrounded by at least one parallel rod forming a coupler and which is substantially the same length as the first rod, set to a reference potential, the coupler rods being evenly distributed radially about the first rod, at a distance of around one-fifth to one-twentieth of the quarter of the wavelength.</p>
申请公布号 EP2338318(B1) 申请公布日期 2015.04.01
申请号 EP20090760171 申请日期 2009.10.16
申请人 CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE 发明人 SORTAIS, PASCAL;LAMY, THIERRY
分类号 H05H1/46;H01J27/16;H01J37/08;H01J37/317 主分类号 H05H1/46
代理机构 代理人
主权项
地址