| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate for mask blank by which, in cleaning a substrate for mask blank, even if a cleaning method is employed using cleaning water with supersonic waves applied, the occurrence of latent damage inside a glass substrate can be suppressed, and particles existing on a substrate principal surface can be also removed reliably. <P>SOLUTION: A manufacturing method of a substrate for mask blank includes a cleaning step in which, toward the surface of a substrate composed of glass material, cleaning water with applied supersonic waves having frequencies of 1.5 MHz or more is applied, thereby cleaning the surface of the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
