发明名称 制造膜之方法、制造光学组件之方法、制造电路板之方法、制造电子组件之方法、及光可固化组成物;METHOD OF PRODUCING FILM, METHOD OF PRODUCING OPTICAL COMPONENT, METHOD OF PRODUCING CIRCUIT BOARD, METHOD OF PRODUCING ELECTRONIC COMPONENT, AND PHOTOCURABLE COMPOSITION
摘要 一种制造膜之方法,包括:配置光可固化组成物于基材上之配置步骤;将该光可固化组成物与模互相接触之模接触步骤;以光照射该光可固化组成物以形成经固化之产物之光照射步骤;以及将该经固化之产物与该模互相脱离之脱模步骤,其中该方法进一步包括在该光照射步骤之前将该模及该基材互相对准之对准步骤,其中该光可固化组成物含有至少作为组分(A)之可聚合之化合物,以及作为组分(B)之光聚合引发剂,且其中当在0.12mW/cm 2 的照度及11.0秒的曝露时间的条件下曝光时,该可聚合之化合物具有50%或更高的聚合转化比。; a mold contact step of bringing the photocurable composition and a mold into contact with each other; a photoirradiation step of irradiating the photocurable composition with light to form a cured product; and a mold release step of releasing the cured product and the mold from each other, in which the method further includes an alignment step of aligning the mold and the substrate with each other before the photoirradiation step, in which the photocurable composition contains at least a polymerizable compound serving as a component (A) and a photopolymerization initiator serving as a component (B), and in which the polymerizable compound has a polymerization conversion ratio of 50% or more when exposed to light under conditions of an illuminance of 0.12 mW/cm 2 and an exposure time of 11.0 seconds.
申请公布号 TW201511926 申请公布日期 2015.04.01
申请号 TW103131359 申请日期 2014.09.11
申请人 佳能股份有限公司 CANON KABUSHIKI KAISHA 发明人 伊藤俊树 ITO, TOSHIKI;本间猛 HONMA, TAKESHI;米泽诗织 YONEZAWA, SHIORI;川阳司 KAWASAKI, YOUJI
分类号 B29C59/02(2006.01);G03F7/028(2006.01);C08F2/44(2006.01);H01L21/027(2006.01);H05K3/06(2006.01);B29L7/00(2006.01) 主分类号 B29C59/02(2006.01)
代理机构 代理人 林志刚
主权项
地址 日本 JP