发明名称 ステージ装置及びプロセス装置
摘要 According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.
申请公布号 JP5694077(B2) 申请公布日期 2015.04.01
申请号 JP20110156005 申请日期 2011.07.14
申请人 发明人
分类号 H01L21/683;H01L21/027;H01L21/205;H01L21/31 主分类号 H01L21/683
代理机构 代理人
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