| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gas barrier film which has a high productivity, and a gas barrier film achieving high gas barrier performance and durability, to provide a process for producing the same, and to provide an organic electronic device using the gas barrier film. <P>SOLUTION: The process for producing the gas barrier film having a gas barrier layer on a base includes a step to form a coated film on the base by coating it with a solution containing polysilazane, a step to subject the coated film obtained to modification treatment, and a step to irradiate it with vacuum ultra violet (VUV) ray in the modification treatment. The process also includes a step to conduct heat treatment at a temperature of not lower than 150°C and not higher than the Tg of the base after the step to form the coated film by the polysilazane coating and at least in one period selected from before, during, and after the modification treatment step. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
