发明名称 Processing tool monitoring
摘要 A monitoring apparatus (40, figure 1) for monitoring at least one processing tool (30, figure 1), a method and computer program product are disclosed. The monitoring apparatus for monitoring at least one processing tool during processing of an effluent stream from a semiconductor processing tool (20, figure 1), comprises: reception logic s1 operable to receive processing characteristic data generated during the processing of the effluent stream; segregation logic s2 operable to segregate the processing characteristic data into contributing processing characteristic data associated with contributing periods which contribute to a condition of the at least one processing tool and non-contributing processing characteristic data associated with non-contributing periods which fail to contribute to the condition; and fault logic s3 operable to utilise the contributing processing characteristic data and to exclude the non-contributing processing characteristic data when determining a status of the condition. In this way, only data generated during periods which contribute to the condition of the tool is used when determining a status of the condition of that tool. Other data generated during periods which do not contribute to that condition are ignored or omitted so that an accurate assessment of the status of the condition of the tool can be determined. This helps to provide an accurate and more reliable assessment of the status of the condition of the tool.
申请公布号 GB201502312(D0) 申请公布日期 2015.04.01
申请号 GB20150002312 申请日期 2015.02.12
申请人 EDWARDS LIMITED 发明人
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代理机构 代理人
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