| 摘要 |
本发明以提供可形成密着性、解析度及抗蚀剂尾渣产生的抑制性优异的抗蚀剂图案的投影曝光用感光性树脂组成物为目的，提供一种投影曝光用感光性树脂组成物，其含有(A)黏合剂聚合物、(B)具有乙烯性不饱和键的光聚合性化合物、(C)光聚合起始剂、及(D)增感色素，且所述(B)具有乙烯性不饱和键的光聚合性化合物包含具有源自二季戊四醇的骨架的(甲基)丙烯酸酯化合物及下述通式(III)所表示的化合物。;[式中，R 8 、R 9 、R 10 及R 11 分别独立地表示氢原子或甲基，X及Y分别独立地表示伸乙基或伸丙基，p1、p2、q1及q2分别独立地表示0~9的数值，p1+q1及p2+q2均为1以上，p1+q1+p2+q2为2~9] The purpose is to provide a photosensitive resin composition for projection exposure to form a resist pattern, wherein the resist pattern is excellent in adhesiveness, resolution, and suppression of formation of a resist hem. The photosensitive resin composition for projection exposure includes (A) a binder polymer, (B) a photopolymerizing compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator, and (D) a sensitizing dye, wherein (B) the photopolymerizing compound having an ethylenically unsaturated bond includes a (meth)acrylate compound having a skeleton derived from dipentaerythritol, and a compound that is represented by the following formula (III). ;(In the formula, each of R 8 , R 9 , R 10 and R 11 independently represents a hydrogen atom or a methyl group, each of X and Y independently represents an ethylene group or a propylene group, each of p1, p2, q1and q2independently represents a numeric of 0 to 9, both of p1+q1and p2+q2are 1 or more, and p1+q1+p2+q2is 2 to 9.) |
