| 摘要 |
<p>To produce a meniscus lens from synthetic quartz glass for use in a microlithography apparatus, which lens has a first optical surface (7) and a second optical surface (8) with the same direction of curvature as the first optical surface (7), SiO2 particles are formed by oxidation or flame hydrolysis of a silicon-containing starting compound and deposited layer by layer on a substrate to form a cylindrical SiO2 blank which contains layers with a surface normal extending in the direction of growth. To allow such layers, which have however the least possible adverse effect on optical or mechanical properties, it is proposed according to the invention that the blank is plastically worked in a hot forming process under the effect of a deforming force to form a preform (6), which has at least the first curved surface (7) and in which the layers are curved in the direction of curvature, and that the meniscus lens is obtained from the preform.</p> |
