| 发明名称 |
Positive resist composition |
| 摘要 |
<p>A positive resist composition having excellent mask linearity is provided. This composition is a positive resist composition comprising a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin and the acid generator component (B) contains an onium salt-based acid generator (B1) containing a perfluoroalkyl sulfonate ion having 3 or 4 carbon atoms as an anion.</p> |
| 申请公布号 |
EP1582926(B1) |
申请公布日期 |
2015.04.01 |
| 申请号 |
EP20050290661 |
申请日期 |
2005.03.25 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
HOSONO, TAKAYUKI;TAMURA, KOKI;KAWANA, DAISUKE;YAMADA, TOMOTAKA |
| 分类号 |
G03F7/039;G03F7/075;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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