发明名称 Method and apparatus for dressing polishing pad
摘要 <p>The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life of the polishing pad. The method for dressing a polishing pad, which has been used to polish a surface of a work by pressing the work onto the polishing pad fixed on a polishing plate (14, 15) with supplying slurry thereto, by using a grind stone, comprising the step of cleaning the polishing pad by supplying high-pressure cleaning water to the polishing pad, is characterized by the step of dressing the polishing pad by moving a dressing grind stone (26), in the radial direction of the polishing pad, along a surface profile thereof, while performing the cleaning step.</p>
申请公布号 EP2397255(A3) 申请公布日期 2015.04.01
申请号 EP20110250579 申请日期 2011.06.03
申请人 FUJIKOSHI MACHINERY CORP. 发明人 KOYAMA, HARUMICHI
分类号 B24B37/04;B24B53/007;B24B53/017;B24B53/02;B24B53/095;B24B53/12 主分类号 B24B37/04
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