光铭印法用的可固化组成物以及利用此组成物制造膜、光学零件、电路板或电子零件的方法;CURABLE COMPOSITION FOR PHOTOIMPRINT AND METHOD OF PRODUCING FILM, OPTICAL COMPONENT, CIRCUIT BOARD, OR ELECTRONIC COMPONENT USING THE COMPOSITION

摘要

一种用于光铭印之可固化组成物，至少包括可聚合之化合物组分(A)以及光聚合引发剂组分(B)，并符合式(1)及(2)：;其中，Er10代表藉由将该用于光铭印之可固化组成物之膜曝于10mJ/cm 2 的光所制备的经光固化之膜的减折模数(GPa)；以及Er200代表藉由将该用于光铭印之可固化组成物之膜曝于200mJ/cm 2 的光所制备的经光固化之膜的减折模数(GPa)。;wherein, Er10represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 10 mJ/cm 2 ; and Er200represents the reduced modulus (GPa) of a photocured film prepared by exposing a film of the curable composition for photoimprint to light of 200 mJ/cm 2 .