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发明名称
研磨用组成物
摘要
本发明之目的系提供一种可充分控制含Si材料之研磨速率之研磨用组成物。;本发明之研磨用组成物含有于表面固定化有满足下述条件(1)及(2)之至少一者之官能基而构成之二氧化矽、与pH调整剂;条件(1):前述官能基具有胺基;条件(2):前述官能基具有卤基。
申请公布号
TW201512384
申请公布日期
2015.04.01
申请号
TW103128792
申请日期
2014.08.21
申请人
福吉米股份有限公司 FUJIMI INCORPORATED
发明人
铃木章太 SUZUKI, SHOTA;井泽由裕 IZAWA, YOSHIHIRO
分类号
C09K3/14(2006.01);H01L21/304(2006.01)
主分类号
C09K3/14(2006.01)
代理机构
代理人
林志刚
主权项
地址
日本 JP
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