| 摘要 |
A device for observation, by reflection, of the structural details of an object (2) that exhibits a behavior that is at least partially specular, located in an exposure area, which includes: at least one radiation source with an emission surface (6) possessing at least two distinct zones (26, 27) emitting streams of radiation, where at least one of the characteristics differs from one zone to the next; an optical projection system that is located in line with the radiation source in relation to the exposure zone, in the path of the radiation; an optical exposure system (18) designed to optically link the entry aperture (14) of the optical projection system and the emission surface (6); a projection surface (10) that is linked optically with the object in the exposure zone, and whose received radiation depends on the deflection on the object (2). |
| 主权项 |
1. An acquisition device for the observation, by reflection, of millimetric or submillimetric structural details of an object (2), exhibiting a behaviour that is at least partially specular, located in an exposure zone (3), characterised in that the device includes:
at least one radiation source (5) with a real or virtual emission surface (6) that possesses at least two distinct regions (8, 9) emitting streams of radiation, where at least one of the characteristics differs from one region to the next, an optical projection system (12) that is located in opposed position with the at least one radiation source in relation to an exposure zone, in the path of the radiation issuing from the at least one radiation source (5), where this optical projection system (12) includes an entry aperture (14), an optical exposure system (18) positioned between the at least one radiation source (5) and the exposure zone (3) and configured to optically conjugate the entry aperture (14) of the optical projection system (12) and the emission surface (6) of the at least one radiation source, the optical conjugation of the entry aperture (14) and the optical projection system (12) meaning that different rays issued from a same point of the emission surface (6) and having different directions intersect at the same point at the entry aperture (14), a projection surface (10) located in opposed position with the exposure zone (3) in relation to the optical projection system (12), the optical projection system (12) including at least one lens for another optical conjugation, which optically conjugates the projection surface (10) with the object in the exposure zone (3), the another optical conjugation of the projection surface (10) with the object in the exposure zone (3) meaning that different rays issued from a same point of the object (2) and having different directions intersect at the same point at the projection surface (10). |
