发明名称 Dual-port SRAM systems
摘要 Schematic circuit designs for a dual-port SRAM cell are disclosed, together with various layout schemes for the dual-port SRAM cell. The dual-port SRAM cell comprises a storage unit and a plurality of partial dummy transistors connected to the outputs of the storage unit. Various layout schemes for the dual-port SRAM cell are further disclosed. A gate electrode serves as the gate for a pull-down transistor and a pull-up transistor, a gate of a first partial dummy transistor, and a gate of a second partial dummy transistor. A butt contact connects a long contact to the gate electrode. The long contact further connects to a drain of a pull-down transistor, a drain of a pull-up transistor, a drain of a first pass gate, and a drain of a second pass gate, wherein the first pass gate and the second pass gate share an active region.
申请公布号 US8995176(B2) 申请公布日期 2015.03.31
申请号 US201313789090 申请日期 2013.03.07
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Liaw Jhon Jhy
分类号 G11C11/00;G11C11/412 主分类号 G11C11/00
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A device comprising: a data latch storage unit comprising a first inverter having a first output and a first input, and a second inverter having a second output directly coupled to the first input, and a second input directly coupled to the first output, the second output being a complement of the first output; a first dummy circuit comprising a first plurality of dummy transistors connected to the first output; and a second dummy circuit comprising a second plurality of dummy transistors connected to the second output, wherein a respective one of the first plurality of dummy transistors and the second plurality of dummy transistors is formed in a respective active area of a substrate, and wherein an edge of the respective active area does not extend beyond a width of a gate electrode of the respective one of the first plurality of dummy transistors and the second plurality of dummy transistors.
地址 Hsin-Chu TW