发明名称 Imprint apparatus and article manufacturing method
摘要 An imprint apparatus which brings a resin on a substrate into contact with a pattern surface of a mold and cures the resin, includes a substrate holder which holds the substrate, a mold holder which holds the mold with a mold holding surface, a driving mechanism which moves the substrate holder relative to the mold holder, and a controller which controls the driving mechanism such that the substrate holder moves relative to the mold holder while the substrate holder holds a cleaning member instead of the substrate, and the cleaning member is in contact with the mold holding surface, thereby cleaning the mold holding surface.
申请公布号 US8992206(B2) 申请公布日期 2015.03.31
申请号 US201213413913 申请日期 2012.03.07
申请人 Canon Kabushiki Kaisha 发明人 Wakabayashi Kohei
分类号 B29C59/00;B29C37/00;B29C59/02 主分类号 B29C59/00
代理机构 Rossi, Kimms & McDowell LLP 代理人 Rossi, Kimms & McDowell LLP
主权项 1. An imprint apparatus which brings a resin on a substrate into contact with a pattern surface of a mold and cures the resin, comprising: a curing unit; a mold holder configured to hold a mold with a mold holding surface; a cleaning member configured to be capable of cleaning the mold holding surface by friction between the mold holding surface and the cleaning member; a substrate holder which is adapted to hold either a substrate or the cleaning member; a driving mechanism which moves the substrate holder relative to the mold holder; and a controller configured to control the driving mechanism to move the cleaning member relative to the mold holding surface when the mold holding surface is cleaned, such that the substrate holder moves relative to the mold holder to clean the mold holding surface by the friction between the mold holding surface and the cleaning member in a state that the substrate holder holds the cleaning member, and the cleaning member is in contact with the mold holding surface, the relative movement between the substrate holder and the mold holder including at least one of (i) a movement of at least one of the substrate holder or the mold holder in a direction along the mold holding surface, or (ii) a rotation of at least one of the substrate holder or the mold holder around an axis perpendicular to the mold holding surface.
地址 JP