发明名称 |
Transistors, methods of manufacturing thereof, and image sensor circuits with reduced RTS noise |
摘要 |
Transistors, methods of manufacturing thereof, and image sensor circuits with reduced random telegraph signal (RTS) noise are disclosed. In one embodiment, a transistor includes a channel disposed between two isolation regions in a workpiece. The channel has edge regions proximate the isolation regions and a central region between the edge regions. The transistor includes a gate dielectric disposed over the channel, and a gate disposed over the gate dielectric. The transistor includes a voltage threshold modification feature proximate the edge regions configured to increase a voltage threshold of the transistor proximate edge regions relative to the central region of the channel. |
申请公布号 |
US8994082(B2) |
申请公布日期 |
2015.03.31 |
申请号 |
US201113250856 |
申请日期 |
2011.09.30 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Hung Feng-Chi;Sze Jhy-Jyi;Wuu Shou-Gwo |
分类号 |
H01L31/062;H01L31/113;H01L21/265;H01L29/78;H01L27/146;H01L21/28 |
主分类号 |
H01L31/062 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A transistor, comprising:
a channel disposed between two isolation regions laterally spaced apart by an uninterrupted portion of a semiconductor material in a workpiece, the channel comprising edge regions proximate the isolation regions and a central region between the edge regions; a gate dielectric disposed over the channel and extending over a portion of the two isolation regions; and a voltage threshold modification feature configured to increase a voltage threshold of the transistor proximate edge regions relative to the central region of the channel, the voltage threshold modification feature comprising a gate disposed over the gate dielectric, the gate having a greater amount of implanted dopants in a central region of the gate than in portions of the gate proximate the two isolation regions. |
地址 |
Hsin-Chu TW |