| 发明名称 | Photosensitive resin composition for microlens | ||
| 摘要 | There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.; | ||
| 申请公布号 | US8993699(B2) | 申请公布日期 | 2015.03.31 |
| 申请号 | US201013391761 | 申请日期 | 2010.06.21 |
| 申请人 | Nissan Chemical Industries, Ltd. | 发明人 | Kishioka Takahiro;Sakaguchi Takahiro |
| 分类号 | G03F7/004;G02B1/04;C08F26/06;G03F7/00;G03F7/023;G03F7/40 | 主分类号 | G03F7/004 |
| 代理机构 | Oliff PLC | 代理人 | Oliff PLC |
| 主权项 | 1. A photosensitive resin composition for a microlens, the photosensitive resin composition comprising: a component (A); a component (B); and a component (C), wherein the component (A) is a copolymer selected from the group consisting of a copolymer having structural units selected from the group consisting of a copolymer having structural units selected from the group consisting of a copolymer having structural units selected from the group consisting of a copolymer having structural units selected from the group consisting of a copolymer having structural units selected from the group consisting of and a copolymer having structural units selected from the group consisting ofthe component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent. | ||
| 地址 | Tokyo JP | ||