发明名称 Method and device for peeling off silicon wafers
摘要 A device for peeling off silicon wafers, including: a supporting member that is configured to support a board-shaped member to which plural silicon wafers are bonded via an adhesive; a heating unit for heating the board-shaped member; a shifting mechanism that is configured to shift, in a horizontal direction, the supporting member relatively with respect to the heating unit; a peeling-off mechanism that is configured to peel off the silicon wafers one by one; and a container for allowing the silicon wafers, the board-shaped member and the supporting member to soak in a liquid.
申请公布号 US8992726(B2) 申请公布日期 2015.03.31
申请号 US201313900615 申请日期 2013.05.23
申请人 Panasonic Intellectual Property Management Co., Ltd. 发明人 Matsuno Koso;Yoshino Michirou;Takahashi Masayuki;Furushige Tooru;Yamamoto Yuji
分类号 B32B38/10;B28D5/00 主分类号 B32B38/10
代理机构 RatnerPrestia 代理人 RatnerPrestia
主权项 1. A method for peeling off silicon wafers, wherein plural silicon wafers, which are bonded to a beam via an adhesive, are peeled off from the beam in a liquid by heating of the beam, the beam includes a plane, each of the plural silicon wafers includes a plane, in a state where each of the planes of the plural silicon wafers is substantially perpendicular to the plane of the beam, the plural silicon wafers are arranged, with gaps between the adjacent silicon wafers, on an upper side of the plane of the beam with respect to a vertical direction, and in a state where edges of the plural silicon wafers are bonded to the plane of the beam via the adhesive, the peeling off of the silicon wafers is repeatedly performed one by one from an outermost side of the plural silicon wafers arranged.
地址 JP