发明名称 |
Semiconductor device and method of bonding different size semiconductor die at the wafer level |
摘要 |
A semiconductor wafer has first and second opposing surfaces. A plurality of conductive vias is formed partially through the first surface of the semiconductor wafer. The semiconductor wafer is singulated into a plurality of first semiconductor die. The first semiconductor die are mounted to a carrier. A second semiconductor die is mounted to the first semiconductor die. A footprint of the second semiconductor die is larger than a footprint of the first semiconductor die. An encapsulant is deposited over the first and second semiconductor die and carrier. The carrier is removed. A portion of the second surface is removed to expose the conductive vias. An interconnect structure is formed over a surface of the first semiconductor die opposite the second semiconductor die. Alternatively, a first encapsulant is deposited over the first semiconductor die and carrier, and a second encapsulant is deposited over the second semiconductor die. |
申请公布号 |
US8993377(B2) |
申请公布日期 |
2015.03.31 |
申请号 |
US201113231839 |
申请日期 |
2011.09.13 |
申请人 |
STATS ChipPAC, Ltd. |
发明人 |
Koo Jun Mo;Marimuthu Pandi C.;Yoon Seung Wook;Shim Il Kwon |
分类号 |
H01L21/56;H01L25/07;H01L23/00;H01L21/683;H01L21/768;H01L25/065;H01L23/31;H01L25/10 |
主分类号 |
H01L21/56 |
代理机构 |
Patent Law Group: Atkins and Associates, P.C. |
代理人 |
Atkins Robert D.;Patent Law Group: Atkins and Associates, P.C. |
主权项 |
1. A method of making a semiconductor device, comprising:
providing a semiconductor wafer including an active surface and a second surface opposite the active surface; forming a plurality of conductive vias partially through the active surface of the semiconductor wafer; singulating the semiconductor wafer to separate a first semiconductor die; disposing a second semiconductor die over the first semiconductor die with the active surface oriented toward the second semiconductor die; depositing an encapsulant over and around the first and second semiconductor dies; removing a portion of the second surface to expose a surface of the conductive vias coplanar with the second surface and the encapsulant; and forming an interconnect structure over the first semiconductor die opposite the second semiconductor die, the interconnect structure including a first insulating layer and a first conductive layer. |
地址 |
Singapore SG |