Drawing apparatus and method of manufacturing article

摘要

The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, including an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams, a deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors, and a controller configured to control deflection of the charged particle beams by the first deflectors to reduce a dispersion of intensities of the respective charged particle beams on the substrate.

主权项

1. A drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, comprising:
an aperture array configured to include a plurality of apertures for shaping the respective charged particle beams; a first deflection unit configured to include a plurality of first deflectors which are arranged on a side, with respect to the aperture array, of a charged particle source for radiating a charged particle beam and which deflect the respective charged particle beams, and to individually change irradiated positions of the respective charged particle beams on the aperture array by driving the respective first deflectors; a second deflection unit configured to be arranged on a different position from the first deflection unit, to include a plurality of second deflectors which deflect the respective charged particle beams, and to perform irradiation or non-irradiation of the substrate with the charged particle beams by driving the respective second deflectors; and a controller configured to control the first deflection unit so that a dispersion of amounts of current of the plurality of charged particle beams on the substrate is reduced by deflecting each of at least a part of charged particle beams among the plurality of charged particle beams, with first deflectors corresponding to each of the at least a part of charged particle beams among the plurality of first deflectors, in a direction to which an amount of current of charged particle beam passing through the aperture is decreased.