发明名称 |
Manufacturing method of liquid discharge head |
摘要 |
This invention is a manufacturing method of a liquid discharge head that includes a substrate having a plurality of discharge energy generating elements that generate energy that is utilized for discharging a liquid, and a discharge port forming member that constitutes a discharge port group including a plurality of discharge ports that discharge the liquid and flow paths that communicate with the discharge port group. The manufacturing method includes (1) disposing a photosensitive resin as material of the discharge port forming member on or above the substrate, and (2) forming an exposure pattern of the discharge port group using ultraviolet light in the photosensitive resin. In the aforementioned (2), the discharge port group is divided in a longitudinal direction and exposed, and the exposures are respectively performed so that regions in which there is a high degree of telecentricity face each other. |
申请公布号 |
US8991051(B2) |
申请公布日期 |
2015.03.31 |
申请号 |
US201213706670 |
申请日期 |
2012.12.06 |
申请人 |
Canon Kabushiki Kaisha |
发明人 |
Ishimatsu Shin;Fujii Kenji;Kurosu Toshiaki;Manabe Takanobu;Muraoka Chiaki;Takahashi Sayaka;Yamaguchi Yukuo |
分类号 |
B21D53/00;B41J2/16;B41J2/14 |
主分类号 |
B21D53/00 |
代理机构 |
Fitzpatrick, Cella, Harper & Scinto |
代理人 |
Fitzpatrick, Cella, Harper & Scinto |
主权项 |
1. A manufacturing method of a liquid discharge head that includes a substrate having a plurality of discharge energy generating elements that generate energy that is utilized for discharging a liquid, and a discharge port forming member that comprises a discharge port group comprising a plurality of discharge ports that discharge the liquid and flow paths that communicate with the discharge port group, the method including:
(1) disposing a photosensitive resin as a material of the discharge port forming member on or above the substrate; and (2) forming an exposure pattern of the discharge port group in the photosensitive resin using ultraviolet light; wherein, in the forming of (2), the discharge port group is divided in a longitudinal direction and exposed, and the exposures are respectively performed so that regions in which there is a high degree of telecentricity face each other. |
地址 |
Tokyo JP |