| 发明名称 | Lithographic apparatus and device manufacturing method | ||
| 摘要 | A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity. | ||
| 申请公布号 | US8994919(B2) | 申请公布日期 | 2015.03.31 |
| 申请号 | US200812244326 | 申请日期 | 2008.10.02 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Butler Hans;Van Der Wijst Marc Wilhelmus Maria;De Hoon Cornelius Adrianus Lambertus |
| 分类号 | G03B27/42;G03F7/20;G05D19/02 | 主分类号 | G03B27/42 |
| 代理机构 | Sterne, Kessler, Goldstein & Fox P.L.L.C. | 代理人 | Sterne, Kessler, Goldstein & Fox P.L.L.C. |
| 主权项 | 1. A control system comprising: a measurement system configured to measure a position or position related quantity of an object; a controller configured to provide a control signal based on the measured position or position related quantity; an actuator configured to actuate the object based on the control signal; and a partial order filter unit configured to filter the measured position or position related quantity. | ||
| 地址 | Veldhoven NL | ||