发明名称 Photoelectric conversion element
摘要 A photoelectric conversion element includes a photoelectric conversion layer to include a first metal layer, a semiconductor layer, and a second metal layer, all of which are laminated. In addition, at least one of the first metal layer and the second metal layer is a nano-mesh metal having a plurality of through holes or a dot metal having a plurality of metal dots arranged separately from each other on the semiconductor layer. The photoelectric conversion layer includes a long-wavelength absorption layer containing an impurity which is different from impurities for p-type doping and n-type doping of the semiconductor layer. The long-wavelength absorption layer is within a depth of 5 nm from the nano-mesh metal or the dot metal.
申请公布号 US8993869(B2) 申请公布日期 2015.03.31
申请号 US201213422728 申请日期 2012.03.16
申请人 Kabushiki Kaisha Toshiba 发明人 Fujimoto Akira;Nakanishi Tsutomu;Nakamura Kenji;Masunaga Kumi;Asakawa Koji
分类号 H01L31/0232;H01L31/0224;H01L31/0216;H01L31/0288 主分类号 H01L31/0232
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A photoelectric conversion element comprising: a semiconductor layer having a p-type semiconductor layer and an n-type semiconductor layer to form a pn-junction; a long-wavelength absorption layer partially provided in the p-type semiconductor layer within a depth of 5 nm from a surface of the p-type semiconductor layer, the long-wavelength absorption layer containing an impurity different from impurities for p-type doping and n-type doping of the semiconductor layer and absorbing light having a wavelength longer than light absorbed into the semiconductor layer, the light entering from a side of the n-type semiconductor layer; and a metal layer provided to contact the long-wavelength absorption layer, the metal layer being a nano-mesh metal having a plurality of through holes or a dot metal having a plurality of metal dots arranged separately from each other.
地址 Tokyo JP