Method for manufacturing solar cell

摘要

A method of manufacturing a solar cell is disclosed. The method includes forming a dielectric film on a semiconductor substrate doped with a first conductive type impurity, exposing a high concentration doping region of a predetermined selective emitter by partially removing the dielectric film, and ion-implanting a second conductive type impurity into a front surface of the semiconductor substrate with the dielectric film formed thereon to form a high concentration doping layer in the semiconductor substrate to correspond to the high concentration doping region and to form a low concentration doping layer in the semiconductor substrate to correspond to a region in which the dielectric film is formed.

主权项

1. A method of manufacturing a solar cell, the method comprising:
(a) forming a dielectric film on a front surface of a semiconductor substrate doped with a first conductive type impurity; (b) following step (a), exposing a high concentration doping region of a predetermined selective emitter by partially removing the dielectric film; and (c) following step (b), ion-implanting a second conductive type impurity into the front surface of the semiconductor substrate to form a high concentration doping layer in the semiconductor substrate to correspond to the high concentration doping region and to simultaneously form a low concentration doping layer in the semiconductor substrate to correspond to a region in which the dielectric film is formed without the use of a high-temperature process.