发明名称 Positive photosensitive siloxane composition
摘要 A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000 Å/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000 Å/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000 Å/sec relative to a 2.38 weight % TMAH aqueous solution. (In the formula, R1 represents a C1-20 linear or branched cyclic alkyl group, in which any methylene may be substituted by oxygen, or a C6-20 aryl group, in which any hydrogen may be substituted by fluorine; n represents a 0 or a 1; and R2 represents a C1-5 alkyl group.)
申请公布号 US8993214(B2) 申请公布日期 2015.03.31
申请号 US201214117433 申请日期 2012.05.15
申请人 AZ Electronic Materials USA Corp. 发明人 Yokoyama Daishi;Fuke Takashi;Tashiro Yuji;Sekito Takashi;Nonaka Toshiaki
分类号 G03F7/075;G03F7/039;G03F7/022 主分类号 G03F7/075
代理机构 代理人 Jain Sangya
主权项 1. A positive photosensitive siloxane composition comprising polysiloxane (I), a diazonaphthoquinone derivative (II), and a solvent (III), wherein the polysiloxane (I) contains at least one of polysiloxane (Ia) below, at least one of polysiloxane (Ib) below, and at least one of polysiloxane (Ic) below,(A) Polysiloxane (Ia): a polysiloxane, where a prebaked film of which is soluble in a 5 wt % tetramethylammonium hydroxide aqueous solution and which has a dissolution rate of 1,000 Å/second or less in a 5 wt % tetramethylammonium hydroxide aqueous solution and is obtained by hydrolyzing and condensing, in the presence of an acidic or basic catalyst, a silane compound represented by the formula (1); R1nSi(OR2)4-n  (1)wherein R1 represents a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, in which any methylene group may be replaced by an oxygen atom, or an aryl group having 6 to 20 carbon atoms, in which any hydrogen atom may be replaced by a fluorine atom, R2 represents an alkyl group having 1 to 5 carbon atoms, and n is 0 or 1,(B) Polysiloxane (Ib): a polysiloxane, where a prebaked film of which has a dissolution rate of 4,000 Å/second or more in a 2.38 wt % tetramethylammonium hydroxide aqueous solution and which is obtained by hydrolyzing and condensing the silane compound represented by the formula (1) in the presence of an acidic or basic catalyst,(C) Polysiloxane (Ic): a polysiloxane, where a prebaked film of which has a dissolution rate of 200 Å/second or more and 3,000 Å/second or less in a 2.38% tetramethylammonium hydroxide aqueous solution and which is obtained by hydrolyzing and condensing the silane compound represented by the formula (1) in the presence of an acidic or basic catalyst.
地址 Somerville NJ US
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