Chemical pinning to direct addressable array using self-assembling materials

摘要

A method includes: providing a substrate having a plurality of chemically contrasted alignment features, and depositing a self-assembled material on at least a portion of the substrate, wherein the position and/or orientation of substantially spherical or cylindrical domains of the self-assembled material is directed by the alignment features, to form a nanostructure pattern, and wherein the period of the alignment features is between about 2 times and about 10 times the period of the spherical or cylindrical domains. An apparatus fabricated according to the method is also provided.

主权项

1. A method comprising:
applying a polymer brush layer to a substrate; coating the brush layer with a photoresist layer; patterning the photoresist layer with a regular dot pattern in a bit area and a non-regular servo pattern in a servo area using a lithography process; forming a first hard mask which covers the non-regular servo pattern in the servo area; depositing a block copolymer which self-assembles in the bit area to form curvilinearly shaped domains guided by the regular dot pattern, the period of the regular dot pattern being between about 2 times and about 10 times the period of the curvilinearly shaped domains, the block copolymer comprising a magnetic component and a non-magnetic component, the magnetic component forming the curvilinearly shaped domains.