发明名称 Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography
摘要 The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique.
申请公布号 US8992992(B2) 申请公布日期 2015.03.31
申请号 US201313852683 申请日期 2013.03.28
申请人 The University of North Carolina at Chapel Hill 发明人 DeSimone Joseph M.;Rolland Jason P.;Maynor Benjamin W.;Euliss Larken E.;Rothrock Ginger Denison;Dennis Ansley E.;Samulski Edward T.;Samulski R. Jude
分类号 A61K9/14;A61K9/00;A61K9/51;B81C99/00;B82Y10/00;B82Y40/00;G03F7/00;H01L51/00 主分类号 A61K9/14
代理机构 Alston & Bird LLP 代理人 Alston & Bird LLP
主权项 1. A plurality of monodisperse micro or nano sized particles, comprising: a pharmaceutically or therapeutically active agent, wherein said agent is present throughout the particle; wherein each particle of the plurality has a substantially uniform three-dimensional engineered shape having parallel lateral surfaces and parallel top and bottom surfaces in cross-section, wherein; the size of each particle of the plurality is less than about 100 micrometers in a broadest dimension.
地址 Chapel Hill NC US