发明名称 |
Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography |
摘要 |
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique. |
申请公布号 |
US8992992(B2) |
申请公布日期 |
2015.03.31 |
申请号 |
US201313852683 |
申请日期 |
2013.03.28 |
申请人 |
The University of North Carolina at Chapel Hill |
发明人 |
DeSimone Joseph M.;Rolland Jason P.;Maynor Benjamin W.;Euliss Larken E.;Rothrock Ginger Denison;Dennis Ansley E.;Samulski Edward T.;Samulski R. Jude |
分类号 |
A61K9/14;A61K9/00;A61K9/51;B81C99/00;B82Y10/00;B82Y40/00;G03F7/00;H01L51/00 |
主分类号 |
A61K9/14 |
代理机构 |
Alston & Bird LLP |
代理人 |
Alston & Bird LLP |
主权项 |
1. A plurality of monodisperse micro or nano sized particles, comprising:
a pharmaceutically or therapeutically active agent, wherein said agent is present throughout the particle; wherein each particle of the plurality has a substantially uniform three-dimensional engineered shape having parallel lateral surfaces and parallel top and bottom surfaces in cross-section, wherein; the size of each particle of the plurality is less than about 100 micrometers in a broadest dimension. |
地址 |
Chapel Hill NC US |