发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD AND RADIATION-SENSITIVE ACID GENERATOR
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition with improved solubility of an acid generator in solvent, and excellent LWR performance and resolution.SOLUTION: A radiation-sensitive resin composition comprises a polymer having a structural unit comprising an acid dissociable group, and one or more radiation-sensitive acid generator selected from onium salt compounds having cations represented by the formula (1).
申请公布号 JP2015060034(A) 申请公布日期 2015.03.30
申请号 JP20130192864 申请日期 2013.09.18
申请人 JSR CORP 发明人 NAMAI HAYATO
分类号 G03F7/004;G03F7/038;G03F7/039;H01L21/027 主分类号 G03F7/004
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