| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus and the like, by which patterns formed on top and back surfaces of a transparent substrate can be inspected with high accuracy.SOLUTION: A pattern inspection apparatus is adapted for inspection of appearances of wiring patterns 23, 25 formed on top and back surfaces of a transparent film 11, and the apparatus includes: an imaging unit for imaging inspection light that is transmitted through the transparent film 11; and an image processing unit for carrying out inspection by determining whether or not the wiring patterns 23, 25 are acceptable by using an image acquired by the imaging unit. On the transparent film 11, positioning marks 27, 29 in different shapes are formed respectively corresponding to the wiring patterns 23, 25; and the image processing unit aligns a reference pattern 43 by referring the mark 27 on the image, sets the region of the reference pattern 43 as an inspection region of the wiring pattern 23, and aligns the reference pattern by referring the mark 29 on the image, and sets the region of the reference pattern as an inspection region of the wiring pattern 25.</p> |
