| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a cylindrical sputtering target made of a ceramic less likely to generate abnormal discharge, and having high productivity, and to provide a production method thereof.SOLUTION: A cylindrical sputtering target is formed by bonding rear faces 3 of cylindrical sintered bodies 1 made of a ceramic and a backing tube 4 with a soldering material 6 for the rear face. In the cylindrical sputtering target made of the ceramic, the end faces 2 of at least two or more cylindrical sintered bodies 1 are bonded with a soldering material 5 for the end face having a higher melting point than the soldering material 6, and the interval of division parts is below 0.1 mm.</p> |
