发明名称 METHOD FOR CHEMICAL-MECHANICAL POLISHING OF GALLIUM ARSENIDE PLATES
摘要 FIELD: chemistry.SUBSTANCE: method includes treating plates with a rotating polisher and a polishing composition, which additionally contains tartaric acid as a complexing agent and ethylene glycol as a lubricant, with the following content of components, vol %: hydrogen peroxide - 7.0-70.0, 30% aqueous tartaric acid solution - 7.0-60.0, ethylene glycol - 5.0-15.0, deionised water - the balance.EFFECT: single-step treatment using a polishing composition which is abrasive free, high quality of the treated material by reducing surface defects thereof.2 dwg, 1 tbl, 3 ex
申请公布号 RU2545295(C1) 申请公布日期 2015.03.27
申请号 RU20140103552 申请日期 2014.02.03
申请人 OTKRYTOE AKTSIONERNOE OBSHCHESTVO "NPO "ORION" 发明人 KISELEVA LARISA VASIL'EVNA;BOLTAR' KONSTANTIN OLEGOVICH;VLASOV PAVEL VALENTINOVICH;EREMCHUK ANATOLIJ IVANOVICH;EFIMOVA ZINAIDA NIKOLAEVNA;LOPUKHIN ALEKSEJ ALEKSEEVICH;SAVOSTIN ALEKSANDR VIKTOROVICH
分类号 C30B33/00;C30B29/42;H01L21/304;H01L21/306 主分类号 C30B33/00
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